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MEMSnet Home: MEMS-Talk: Re: mems-talk digest, Vol 1 #151 - Yanying Feng
Re: mems-talk digest, Vol 1 #151 - Yanying Feng
2002-01-15
Marty Patton
2002-01-15
shay kaplan
Re: mems-talk digest, Vol 1 #151 - Yanying Feng
Marty Patton
2002-01-15
I recently processed a wafer and mistakenly used the wrong mask at a
certain step.  After removing the photoresist, I noticed that the areas
which had been developed were hydrophillic and the areas which had been
covered with resist were hydrophobic.  I don't know how long the effect
lasts, but I dipped the wafer in water and dried it about 5 times and the
effect remained.
Conditions were AZ 351 developer and AZ positive resist on GaAs (with some
epitaxial stuff on top).

Marty

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