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MEMSnet Home: MEMS-Talk: Re: Low temperature mask for anisotropic etching
Re: Low temperature mask for anisotropic etching
1996-07-03
[email protected]
1996-07-03
[email protected]
Re: Low temperature mask for anisotropic etching
[email protected]
1996-07-03
PECVD nitride can be used, usually deposited at around 350C.
For example, STS (Surface Technology Systems) in Palo Alto
has a PECVD system that deposits nitrides that are
KOH-resistant.

-Lalitha Parameswaran


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