Franck

Hear, hear on intelligence, and reason knowing no nationality!

The irony I was trying to point out is that as small as our community is
(and an even smaller group among the french) that a french researcher was
not aware of this decade old work by his countryman, not of course because
he is french, but because the group of researchers and labs is so very small
in France and french Switzerland (the site of most older SPM developments).

Diamond shafted probes over 100 microns with widths as small as 10 nm (on a
10 degree taper with a 50 nm flare) have been achieved today to make
sidewall profiles. A 1 mm probe of this type with a 500 nm flare fitting in
a 15 micron hole is certainly doable, although the SXM would have to lap
measure the sidewall in 15 micron segments (2 micron overlap). Again there
is no reason to believe such a probe should not resolve to 1 nm in the deep
recess.

Vic

----- Original Message -----
From: Franck Alexis Chollet (Asst Prof) 
To: 
Sent: Saturday, January 26, 2002 3:24 AM
Subject: RE: [mems-talk] measurement of sidewall roughness


> Hi Vic,
> the probe developed allows, in principle, to measure sidewall roughness in
> hole... up to 1mm deep, and about 25um diameter. I don't believe the AFM
probe
> of IBM can do that... but, OK, I never used it :-)
> Moreover, the depth profile resolution seems to be about 70nm and not
500nm.
> Thus the tool developed here has certainly a use, but, it is true that it
may
> not be what the original poster wanted and IBM probe may be the best
suited...
> for his application.
>
> BTW, on a historical note, the first idea of the probe comes from the team
of
> Professor Masuzawa at Tokyo University... a long time ago (more than a
> decade...) - at a time where when I saw MEMS written I just thought it was
> misspelled for 'nems' (which is how the Chinese spring rolls are called in
> French :-)
>
> Happy Chinese new year to everyone!
> Franck
> PS: who cares about the citizenship of inventors? Intelligence has no
> boundary!
>
> "-----Original Message-----
> "From: Vic Kley [mailto:[email protected]]
> "Sent: Friday, 25 January, 2002 16:12
> "To: [email protected]
> "Subject: Re: [mems-talk] measurement of sidewall roughness
> "
> "
> "Fabrice and Emer
> "
> "The first link you provided is bogus. The proper link to the paper of
> "interest is http://www.fujita3.iis.u-tokyo.ac.jp/~limms/
> "
> "However the paper clearly states that the resolution limit of
> "their reported
> "method is presently 500nm! This is unusable and again it is silly to
> "continue looking when in fact the IBM SXM series sidewall profiling AFM
> "already resolves better then 1nm and has been doing so for a
> "decade.  These
> "microscopes have been sold and are in use in Japan where
> "apparently they
> "very much like to reinvent the wheel in collaboration with the
> "French. The
> "funny thing is the IBM scientist who invented the sidewall
> "profiling AFM
> "about 13 years ago is a Frenchman!
> "
> "Vic Kley
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