MEMS-talk

News	MEMSnet Home: MEMS-Talk: [Q] Mask for isotropic silicon wet etch? (fwd) [Q] Mask for isotropic silicon wet etch? (fwd) [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-01 Zigurts Majumdar [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-03 Roger Brennan [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-04 [email protected] [mems-talk] [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-12 Weili Liu Re: Re[2]: [mems-talk] [Q] Mask for isotropic silicon wet etch? 2002-02-13 JAMES.R.THORPE [Q] Mask for isotropic silicon wet etch? (fwd) Zigurts Majumdar 2002-02-01 Hi, I am trying to isotropically wet etch silicon using a 126:60:5 HNO3:H20:NH4F etchant (as described by Williams and Muller, J. of MEMS 1996). The etchant appears to work well, but masks made of AZ5214 do not. In less than 15 minutes, the AZ5214 layer has visibly thinned and formed holes. Can anyone recommend a more durable mask (PR, metal, both or otherwise) for this etchant? Thanks! Ziggy reply
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