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News	MEMSnet Home: MEMS-Talk: [Q] Mask for isotropic silicon wet etch? (fwd) [Q] Mask for isotropic silicon wet etch? (fwd) [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-01 Zigurts Majumdar [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-03 Roger Brennan [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-04 [email protected] [mems-talk] [Q] Mask for isotropic silicon wet etch? (fwd) 2002-02-12 Weili Liu Re: Re[2]: [mems-talk] [Q] Mask for isotropic silicon wet etch? 2002-02-13 JAMES.R.THORPE [Q] Mask for isotropic silicon wet etch? (fwd) Roger Brennan 2002-02-03 Thermally grown SiO2 works rather well for nitric-HF. Silicon nitride has also been used. Do a search for "isotropic etch problem". -----Original Message----- From: Zigurts Majumdar [SMTP:[email protected]] Sent: Friday, February 01, 2002 9:15 AM To: [email protected] Subject: [mems-talk] [Q] Mask for isotropic silicon wet etch? (fwd) Hi, I am trying to isotropically wet etch silicon using a 126:60:5 HNO3:H20:NH4F etchant (as described by Williams and Muller, J. of MEMS 1996). The etchant appears to work well, but masks made of AZ5214 do not. In less than 15 minutes, the AZ5214 layer has visibly thinned and formed holes. Can anyone recommend a more durable mask (PR, metal, both or otherwise) for this etchant? Thanks! Ziggy _______________________________________________ [email protected] mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/ reply
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