The only CVD application I am familiar with using a burn box, is LPCVD boron
nitride.  The motivation was to protect the pump.

I used a rod heater with sheet metal baffles inserted through a length of 40
mm Stainless pipe with Conflat and Ultratorr fittings sealing the cool ends
and a thermocouple to monitor the temperature.

At 600-700 deg C this completely removed any diborane effluent from the
reactor.

This was a home made device.  I don't know if such a thing is available
commercially.

I have run PECVD processes for SiO2 and Silicon Nitride without a burn box.
The silicon nitride process is very rough on pumps, and if a burn box was
effective as it is for boron nitride, I would think they would be commonly
used, which they aren't to my knowledge.

Perhaps a plasma decomposition system would be a more effective solution for
these processes.  I think the name of the company that makes these is
Electrochemical Technology.

If you are only concerned with preventing air pollution, a fume scrubber
should be adequate.

>>> [email protected] 02/01/02 09:18AM >>>
Hi,
  We intend to PECVD deposit SiO2, Silicon Nitride and amorphous silicon
so we will likely be using SiH4, N2O, and NH3. Can anyone tell me what
sort of burn box we will require?

Thanks,
   Mike
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/