Dear MEMS-talk members,

I'm thinking of using SU-8 resist for my experiments. I heard that since
this resist is a chemically amplified one, the processing should be done in
amine and air-borne controlled environment.

I spoke to MicroChem representative and he mentioned that processing in
uncontrolled environment may cause T-top effect in features 0.5 5m and
smaller, and should not affect 1 5m and larger geometries. I am going to try
imaging 1-1.5 5m features here.

Does anybody have bad experience with coating and processing this resist
under normal conditions (by "normal" I mean uncontrolled environment, e.g.
clean room without amine contamination control)?

I appreciate any response. Thanks in advance,

Inna.