Sounds like your light source has two different divergence angles, like
an excimer. If you're not placing the mask in contact with the resist,
try that.

-Mike


>>> [email protected] 02/04/02 02:54PM >>>
Hello all,

I am trying to etch glass using photolithography/wet etching
techniques,
but I have made an observation during my lithography steps. I use a
photomask with various horizontal and vertical lines (all 5 um in
width),
after exposing the photoresist (AZ1520) to UV light, developer, and
finally Cr etch, I have noticed that the horizontal lines are ~twice
as
wide as the vertical lines.  Interestingly, by keeping the mask in the
same orientation to the glass, but moving the UV box 90 degrees, the
vertical lines then become ~twice as big as the horizontal lines.

I was wondering if this was a common occurence and if there is a
simple
solution....thought about spinning the photomask and glass or the UV
light
as the glass was being exposed, but just curious if there was a
simpler
solution?  Thanks in advance to any help you can give.

Mike


Michael Roper
University of Florida
Chemistry Department
352-846-0838
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