Re: Re[2]: [mems-talk] [Q] Mask for isotropic silicon wet etch?
JAMES.R.THORPE
2002-02-13
Hi,
>I am also trying to use HNA. I contacted with Shipley and they have
>S1818 and S1827. Will they work as HNA mask and can you suggest a
>receipt?
In my experience, Shipley S1813 doesn't like HNA, even with a good
hardbake. I often use a Cr/Au (10nm/300nm) onto silicon, with masks
patterned using suitable Au and Cr etchants through a S1813 mask.
I've successfully completed etchtimes of 30 mins without any loss of
adhesion to give nice deep profiles.
Rgds
Jim
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Dr Jim Thorpe
Research Fellow
Institute of Microwaves and Photonics
School of Electronic and Electrical Engineering
The University of Leeds
Leeds
LS2 9JT
United Kingdom
Tel: +44 (0)113 233 2049 (Office)
Tel: +44 (0)113 233 2084 (Lab)
Fax: +44 (0)113 244 9451
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