On Thu, 7 Mar 2002, anshu mehta wrote:

> Hi
Greetings!
>  I am using Su-8 5 as a structural layer for my
> device. I looked up Microchem website and they give
> the exposure in terms of mJ/cm2. Is it possible to
> find a rough estimate for exposure time on a
> particular aligner using the mJ/cm2 data?

Well, our aligner (Karl Suss) has a sensor that measures the exposure
power (mW/cm2). Finding the dose from that is pretty simple, assuming it's
a linear relationship.
>
> Also, I wanted to know if it possible to pattern
> parylene?

I have patterned parylene with O2 plasma in an RIE. Selectivity with PR is
about 1:1, and you may find that you have to roughen the parylene to get
the PR to stick to it during spin coating. I roughened using O2 plasma for
a very short time (10 seconds on my machine). If you're patterning it with
SU-8, I suspect you won't have to roughen it.

>
> Thanks,
> Anshu mehta.

You're welcome,
Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 18-121, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
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