Hi,
One solution could be a simple capacitive plasma generator. With this sort
of equipment you have a R/D tool that can plasma treat with a variety of
gasses. With 02 you get a better clean than U.V. ozone generated cleaning,
and the option to add different gasses for R/D exists. For example with CF4
or SF6 you can etch Silicon in all its forms. With a H2 containing gas you
can reduce oxides and clean copper, silver and aluminum. How fragile are your
samples. My company manufactures a capacitive plasma system which I can
supply details off and I can get samples run. A capacitive plasma system
creates the plasma between the plates of a capacitor and as such gives great
uniformity in a plane parallel to the electrodes. Bill Moffat
-----Original Message-----
From: SOOJIN OH [mailto:[email protected]]
Sent: Monday, March 11, 2002 11:16 AM
To: [email protected]
Subject: [mems-talk] [Q]surface cleaning
Hi, I need some surface cleaning equipment to clean the surface of regular
cover glass without damaging it. I wanted to buy "UV-CLEAN" manufactured by
Boekel industries, Inc, but found out they stopped making that model. Would
anydoby please suggest any other manufacturers of similar products? Or some
better ways to clean glass? My purpose is to increase wettability by
removing organic contaminants, and my samples are very fragile. Thank you
very much for your kind answer.
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Soojin Oh
Graduate student in Otto Zhou's group
Rm 163 Phillips Hall
(phone)919-962-3525
(fax) 919-962-0480
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