Well, with wet processing, you can use ALEG-355 from Mallincrodt Baker. It
works quite well. Dry, I would try RIE O2 plasma, but it seems like that
would do something to the chrome.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 18-121, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Battery is safe if not provoked." -- _Batteries in a Portable World_

On Tue, 26 Mar 2002, Mike Tippetts wrote:

> I am currently trying to commision a TePla 300 Plasma processor for the use
> in removing photoresist from devices after RIE but I am left with small
> residues which are impossible to remove. What are the best resist removal
> conditions and how can the temperature be kept as low as possible? Also is
> there any way to strip resist from chrome without removing the chrome as
> well.
>
> Mike Tippetts
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/