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MEMSnet Home: MEMS-Talk: Uniformity issues in E-beam evaporation
Uniformity issues in E-beam evaporation
2002-04-06
Manoj Wadhwa
2002-04-08
Parshant Kumar
2002-04-08
[email protected]
2002-04-09
[email protected]
Uniformity issues in E-beam evaporation
Parshant Kumar
2002-04-08
Hi Manoj

we are doing both the rapid thermal evaporation and
also the ebeam evaporation for the rf MEMS and
BioMEMS, we compare that  ebeam evaporaiton is better
quality for both mems where as the deposition is on
the silicon , polycarbonate, GaAs etc.

Kumar Parshant
Maryland MEMS Lab
www.enme.umd.edu/mml

--- Manoj Wadhwa  wrote:
> Hello everyone,
>
> We are establishing new MEMS facility. We are not
> able to decide whether to go
> for E-beam evaporation or metal sputtering, in
> context to uniformity
> requirements in MEMS for 6" diameter wafers. Can
> someone suggest low cost, low
> throughput sputtering system?
>
> Thanks,
>
> Manoj Wadhwa
> Manager - VLSI
> SCL - India
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