A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: REMOVAL OF NITRIDE
REMOVAL OF NITRIDE
2002-04-22
Haigh, Richard
2002-04-23
Sandra Bermejo
2002-04-22
Michael Pedersen
2002-04-22
Mighty Platypus
2002-04-22
[email protected]
2002-04-22
Craig McGray
2002-04-22
[email protected]
REMOVAL OF NITRIDE
Mighty Platypus
2002-04-22
Hi Richard,
I would say it's highly likely that the silicon will be attacked by
RIE. For selectivity, wet-etching is the way to go. See my earlier reply
to Peng Yao.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Battery is safe if not provoked." -- _Batteries in a Portable World_

On Mon, 22 Apr 2002, Haigh, Richard wrote:

> Dear All
>
> I've had some SOI wafers coated with Si3N4 and patterned on one face.
> Unfortunately, the wrong face has been patterned. I don't want to
> dispose of the wafers because of their cost. I've been told that I can
> have the nitride striped off both faces (with RIE), then re-applied and
> patterned on the correct face. What I need to know, does the stripping
> damage the silicon in anyway?
>
>
> Regards
>
>
>
> Richard Haigh
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMS Technology Review
Harrick Plasma, Inc.
MEMStaff Inc.
Nano-Master, Inc.