Kris,

We have achieved multi-layer microstructures by using
ebeam evaporated metal between the various photoresist
layers to protect the underlying resist layer from
exposure. Give it a try.

Good luck,

Yohannes

--- Kris Armoogum  wrote:
> Dear All,
>
> Has anyone attempted to create a two layered
> structure using Su-
> 2075 where the top layer OVERHANGS the bottom layer?
>
> I am trying to do this using conventional
> photolithography methods
> but without success.
>
> Because the Su-2075 is so transparent, it is
> difficult to judge the
> exact exposure time so that the top layer is not
> crosslinked all the
> way down to the wafer surface.
>
> A sales rep from one of the Su-2075 manufacturers
> thinks this is
> impossible.
>
> Best regards.
>
>
>
>
>
>
> Kris Armoogum
> Microengineering & Biomaterials Group
> Dundee University Tissue Engineering Centre
> School of Engineering,
> University of Dundee
> Dundee DD1 4HN
> Tel: 0044 1382 345641
> Email: [email protected]
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