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MEMSnet Home: MEMS-Talk: HF and photoresist mask
HF and photoresist mask
2002-05-30
Jing Liu
2002-05-30
Mighty Platypus
2002-05-30
Bill Moffat
2002-05-30
Henry Yang
2002-05-30
[email protected]
2002-06-03
Soojin Oh
2002-05-31
Jing Liu
2002-05-31
Mighty Platypus
metal-glass bonding and debonding
2002-06-03
carlton watson
2002-05-31
Greg Miller
2002-05-31
Bill Moffat
2002-05-31
Bill Moffat
2002-05-31
Bill Moffat
2002-05-31
Jing Liu
2002-05-31
Roger Shile
HF and photoresist mask
Greg Miller
2002-05-31
If you have SU-8 it can survive 30% HF solution for at least 2 hours if
properly cure.

Greg Miller
KVH

-----Original Message-----
From: Jing Liu [mailto:[email protected]]
Sent: Thursday, May 30, 2002 2:34 PM
To: [email protected]
Subject: [mems-talk] HF and photoresist mask


To who may concern,

I want to mask HF etching with photoresist. Just now, somebody suggest
me that
for the same thickness of oxide I will etch. The photoresist could stand

buffered HF, but for concentrated HF, it will not. Is it exactly the
case?
Could I be able to find some reference?

BTW, we have Shipley 1813, AZ 5214, Az 9245 in the lab. Does anyone have
some
date of how fast they will etched in HF?

Thanks,

Jing
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