You must be reactively sputtering a compound of Ti - have you checked for
leaks into the chamber?

Mark Leonard
----- Original Message -----
From: "Oliver Powell" 
To: 
Sent: Wednesday, June 05, 2002 1:04 AM
Subject: [mems-talk] Titanium Spluttering


> Hello
>
> I am having a rather difficult time trying to deposit a 200nm layer of
> titanium onto silicon.  Occasionally it works nicely,  but the rest of the
> time I get a thin brightly coloured layer of some enchanted material of
> mystery.
>
> I am spluttering at room T (But I tried higher T also) with 150mW DC and
> about 4mBar Argon Pressure.  Has anybody experienced this before?
>
>
> Thanks
>
> Olly Powell
> School of Microelectronic Engingeering
> Griffith University
> Australia
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