Hi,

1) you will need to use something in the line of:
BCl3 (heavy molecule) and (or CF4) to remove the 'native oxide on Al'.

2) then followed by Cl2/CHF3 to etch and provide anistropy for Al. (can't
remeber the ratio)high power (2hrs?)

3) you will then need to do a 'fluorine exchange', using CF4 to remove 'Cl'
to minimise corrosive HCl.

4) optional = may require a 'despeckle'.

5) once in atmosphere, you will need to quickly 'DI water (and something
else) to it - a wash.

I'm sure someone else can proved further detail on this subject matter.

good luck.


-----Original Message-----
From: lib zhou [mailto:[email protected]]
Sent: 10 June 2002 14:22
To: [email protected]
Subject: [mems-talk] How to plasma etch Al?


Dear all;

I want to plasma etching Al film, in my experiment, the Al film thickness is
300nm~500nm, using photoresist AZ3100 as etching mask, I have
CHF3,SF6,O2,He2,Cl2, can you give me some advice about how to etching Al
film? what's the recipe?what's the important things must be noticed in the
experiments? thank you very much ahead!

best regards,

Lib.
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