Dear Bob.
I am trying for a long time to develop a RIE recipe of nitride with high
selectivity to oxide. Can you suggest me for such a recipe?
Thank You.
________________________________________________________________________
_________
______________________
Mark Schvartzman
Process engineer
GWS Photonics Inc.
Paz Towers, 33, Bezalel st.
Ramat-Gan, 52581, Israel
Tel. 972-3-7534440
Cell. 972-51-722389
E-mail: [email protected]


-----Original Message-----
From: [email protected] [mailto:[email protected]]
Sent: Tuesday, June 25, 2002 4:00 PM
To: [email protected]
Subject: Re: [mems-talk] SIN etching


Have you considered rie etching the SiN? The results should be very
acceptable with selectivity to the underlying oxide around 5:1 using a
fluorine plasma. bob henderson
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/