Hi,

I am having problems with developing photoresist on quartz wafer. The
photoresist is not sticking to the quartz. Has anyone experienced similar
problems. In particular, with AZ 5214E which i want to use for patterning
metal using liftoff. The procedure that i followed is

a) 1.50 HF dip for 15sec
b) spin-on HMDS+AZ5214
c) soft back @ 90C/60sec
d) Expose for 8sec
e) Hard bake for 110C/45sec
f) Flood expose for 85sec.

I followed the above procedure on glass and it worked well. Any help on the
same will be appreciated

thanks

bala