Hi,

It seem that your process does not include the Dehydration bake process before
applying the HMDS.
Also after the the HF dip, I think you should do the DI water dip as well.

Cheers,

AJ


----- Original Message -----
From: "Balaji Lakshminarayanan" 
To: 
Cc: 
Sent: Wednesday, July 03, 2002 1:04 PM
Subject: [mems-talk] Problems with liftoff(on quartz)


> Hi,
>
> I am having problems with developing photoresist on quartz wafer. The
> photoresist is not sticking to the quartz. Has anyone experienced similar
> problems. In particular, with AZ 5214E which i want to use for patterning
> metal using liftoff. The procedure that i followed is
>
> a) 1.50 HF dip for 15sec
> b) spin-on HMDS+AZ5214
> c) soft back @ 90C/60sec
> d) Expose for 8sec
> e) Hard bake for 110C/45sec
> f) Flood expose for 85sec.
>
> I followed the above procedure on glass and it worked well. Any help on the
> same will be appreciated
>
> thanks
>
> bala
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