Hi,

What is the typical clean procedure you recommend (piranah etch or do you
have anything else in mind??).

thanks for your help

bala

----- Original Message -----
From: "Piao, Fan" 
To: 
Sent: Wednesday, July 03, 2002 12:19 PM
Subject: RE: [mems-talk] Problems with liftoff(on quartz)


> Hi,
>
> You may need to clean your wafer surface better before you
> put resist on. Polymer might be the cause for non-sticking
> surface.
> Good luck,
>
> Fan
>
> -----Original Message-----
> From: Balaji Lakshminarayanan [mailto:[email protected]]
> Sent: Wednesday, July 03, 2002 5:04 AM
> To: [email protected]
> Cc: [email protected]
> Subject: [mems-talk] Problems with liftoff(on quartz)
>
>
> Hi,
>
> I am having problems with developing photoresist on quartz wafer. The
> photoresist is not sticking to the quartz. Has anyone experienced similar
> problems. In particular, with AZ 5214E which i want to use for patterning
> metal using liftoff. The procedure that i followed is
>
> a) 1.50 HF dip for 15sec
> b) spin-on HMDS+AZ5214
> c) soft back @ 90C/60sec
> d) Expose for 8sec
> e) Hard bake for 110C/45sec
> f) Flood expose for 85sec.
>
> I followed the above procedure on glass and it worked well. Any help on
the
> same will be appreciated
>
> thanks
>
> bala
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