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MEMSnet Home: MEMS-Talk: RE: AZ4562 or other thick photoresist
AZ4562 or other thick photoresist
2002-07-02
hzeng
Problems with liftoff(on quartz)
2002-07-03
Balaji Lakshminarayanan
2002-07-03
A.J Pang
2002-07-03
Qingwei Mo
RE: AZ4562 or other thick photoresist
2002-07-05
hzeng
2002-07-08
Anatoli Olkhovets
2002-07-03
Grobe, Dirk
2002-07-08
Danny Hirdes
RE: AZ4562 or other thick photoresist
Anatoli Olkhovets
2002-07-08
>These answers provided abundant options in thick photoresist
applications,
>but they all have a thickness limit below 100 microns, so I'm still
curious
>is there any positive resist with the thickness of more than 300um,
which is
>sensitive for UV light and easy to be removed by chemical liquid.

I don't think you can reliably put such thick resist films. The resist
will have to be very viscous, and you will have lots of difficulties with
uniformity and trapped bubbles. You may try applying several coats (spin,
soft bake, repeat). Also I know that in LCD screen industry people use
so-called slot coaters to produce thick uniform films.

Regards,
Anatoli Olkhovets,
Lucent - Bell Labs.

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