Mike,
Silicon may have a range of contact angles from near 5 degrees to 90 degrees
depending upon what has been done to it.  In the case of your RCA clean,
surely 5-10 is typical.  In addition, if the surface has seen any other
chemical processing the angle may be changed.

Native oxide:           20-30 degrees
Sulfuric/Nitric Aced:   5-10 degrees
HMDS Type Process A:    65-75 degrees
HMDS Type Process B:    75 or more
and so on.

Therefore, Changhong should indicate the exact conditions for his silicon
surface that he is interested in.

Clif

Clifford J. Hamel
Suss Microtec Applications Engineer
(802) 244-5181, ext 297

>>> [email protected] 07/17/02 11:24AM >>>
Contact angle will depend on the surface chemistry of the silicon. That
is what types and how many fucntional groups are attached to the
surface. For example, I can bring the contact angle to very low values
by using a base clean (RCA Clean).

-Mike

>>> [email protected] 07/17/02 07:32AM >>>
I recently tested the CA of water on Si using OCA system. The results
are in the range of 70 - 75.

Xiaodong


--- changhong ke  wrote:
> Dear Members:
>
> Currently I want to know the contact angle of water on Si substrate
> and Cr
> substrate. However, I couldn't find it in  handbooks.
> If you happen to know the information, please drop me an emai, your
> help is
> greatly appreciated.
>
> changhong
> --------------------------------------
> Changhong Ke
> Mechanical Engineering
> Northwestern University
> 2145 Sheridan Road
> Evanston,IL 60208-3111 USA
> Lab Phone:(847)467-7673
> Fax:(847)491-3540
> E_mail:[email protected]
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