I seem to recall having to reduce the size of the model created in AutoCad
to get ACES to do the simulation in a reasonable time. I gave up paying
attention to the numbers and units in ACES, as they didn't seem to make any
sense e.g. etching for one minute with an etch rate of 1 micron/min did not
result in a one micron etch depth. I therefore only looked for qualitive
results.
Also, ACES does not allow specifying an etch rate for the 4-1-1 plane. Some
researchers contend 4-1-1 is the fastest etching Si plane in KOH, and
therefore dominates the errosion of convex corners. If that is the case, I
would expect ACES to give erronious results for any simulation, other than
the trivial cases of edges bounded by 1-1-1 planes.
Perhaps there is an ACES expert out there who can clarify these issues for
us.
Roger Shile
-----Original Message-----
From: Luiz Marangoni [mailto:[email protected]]
Sent: Wednesday, July 31, 2002 3:26 PM
To: [email protected]
Subject: RE: [mems-talk] Masks for ACES simulations
First of all, thank you for your attention Roger,
I tried this procedure, but the size of the exported bitmap file is
diferent of the size the file generated in AutoCAD. Some insight about this
problem?
Thank you,
Luiz Marangoni
>You can generate masks for ACES simulations using AutoCad as follows:
>
>Make sure you set the drawing background in AutoCad to white. Draw your
>mask, using "solid" regions in black, then export the drawing as a bitmap.
>
>Roger Shile
>
>-----Original Message-----
>From: Luiz Marangoni [mailto:[email protected]]
>Sent: Monday, July 29, 2002 5:15 PM
>To: MEMS Talk List
>Subject: [mems-talk] Masks for ACES simulations
>
>
>Hello folks,
>
>I4m starting to use ACES (Anisotropic Etch Simulator) to simulate some
>structures but I didn4t find a (good) way to generate the masks to use in
>the simulations.
>I4m using FreeHand (a vetorial editor) to generate the masks and to export
>in BMP format, but I4m facing some ems with this procedure (distortion of
>the dimensions).
>Someone know some way to use AutoCad or LASI to generate the masks or have
>used the CIF or GDS formats in ACES simulations?
>Thanks in advance,
>
>Luiz Marangoni
>UNICAMP - Campinas - Brazil
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