Hi Karen,
Do you know if a silicon process & a Ge process can be run
through the same wetbench without cross-contamination ?
Thanks, Maurice
Maurice H. Norcott
Senior R&D Technician
Silicon Genesis Corporation
590 Division Street
Campbell, CA 95008
408-228-5847
Pager 408-977-6333
-----Original Message-----
From: Attenborough, Karen [mailto:[email protected]]
Sent: Thursday, August 01, 2002 7:29 AM
To: '[email protected]'
Subject: RE: [mems-talk] Cleaning Germainium Wafers
Hi Maurice
In the past, I have used Ge and used the following process steps to clean
it.
rinse in cold and hot Acetone, followed by cold and hot IPA
dip 1 min. in 10% NH4OH:H2O
rinse at least 10 min. in DI-water
blow dry with special care because Germanium is hydrophilic
I only used small pieces of wafer, so the above process may not be perfectly
compatible with what you are using.
Hope this helps
With best wishes
Karen Attenborough
Dr. Karen Attenborough
OnStream MST B.V.
Lodewijkstraat 1
5652 AC Eindhoven
The Netherlands
Tel: +31.40.295.9814
Fax: +31.40.295.9906
Email: [email protected]
www.onstreammst.com
-----Original Message-----
From: Maurice Norcott [mailto:[email protected]]
Sent: 01 August 2002 04:02
To: '[email protected]'
Subject: [mems-talk] Cleaning Germainium Wafers
Sorry, I should have been more specific. I have a wafer cleaning sink
with megasonics etc. What I am looking for is recommended chemistries
to clean the Ge wafers in.
Maurice H. Norcott
Senior Technician
Silicon Genesis Corporation
590 Division Street
Campbell, CA 95008
408-871-3948 Office
408-977-6333 Pager
[email protected]
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