I used positive photoresist as a sacrificial layer when making valves with
silicone rubber membranes (see Hilton Head 96 Proceedings p. 272).

The release is easy, and was done with a standard metal-compatible resist
stripping solution. But is was helped by the fact that the silicone rubber
easily transmits vapors, and thus the resist was liquified through the
membrane.

With metals, I would recommend ultrasonic agitation of the wafer while in
the resist strip bath to help the process.

Stiction afterwards is a potential problem with any sacrifial layer
process, but  will probably depend on the surfaces after the release more
than on the nature of the sacrificial layer.

Luc Bousse
Caliper Technologies



>I'm trying ot develop a device that will include metal cantilevers and
>would like to use photoresist as a release layer.  I can't find any
>references to any experience in this. Does anybody have any advice (don't
>try this, it's easy, ...)or pointers to references?
>
>Thanks,
>         Mike
>
>
>
>                 Mike
>
>
>