A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: KOH etching equipment
KOH etching equipment
1996-12-11
MICHIEL HAMBERG
KOH etching equipment
MICHIEL HAMBERG
1996-12-11
We are discussing extension of our current KOH-etching equipment with
a new, preferably automated, etch equipment.

Our current automated etcher was deliverd by PMPLAST and hasn't worked
so well, so we are looking for other providers.

Our wish list of desired properties for the etcher:
- Programmable etching time
- Automatic rinse and filling of the etch beaker with water after
etching.
- Operation temperature 30-85 degrees C
- Suitable for batch of min. 12 wafers of 4 inch
- Homogeneous temperature distriburion
- Capability of running with ultra sound
- Re-usable etchant option

Note: above list is a list of all our wishes, not all are requirements!

Could any of you please comment on your experience/equipment?

----------------------------------------------
Michiel Hamberg
IMC AB
Box 1084
S-164 21 Kista-Stockholm
Sweden
telephone +46 8 752 10 70
fax.      +46 8 750 54 30
pager     +46 740 301 396
e-mail [email protected]
WWW    http://www.imc.kth.se/~michiel
----------------------------------------------


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Mentor Graphics Corporation
University Wafer
Nano-Master, Inc.
Tanner EDA by Mentor Graphics