The reference , M. Kohler, "Etching in Microsystem Technology ", Wiley,1999
gives an etchant without HF:

NaOH 7 mol/l
H2O2 0.9 mol/l
Temp : 90 C
Rate : 1.7 .. 3.3 nm/s

Oray Orkun Cellek
[email protected]
Middle East Technical Univ.
EE Dept.
Ankara
Turkey

----- Original Message -----
From: "Neal Ricks" 
To: 
Sent: Tuesday, August 27, 2002 11:19 PM
Subject: Re: [mems-talk] Tantalum nitride etch


> Have you tried the published Tantalum etches, or do you have to avoid use
of HF?
>
>
>  Peter & Judy Wright
> wrote:Does anyone know of a wet etch for tantalum nitride? We are using it
for an
> underbump metalization at a subcontractor who does not have a dry etch
> capability.
>
> Peter Wright
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