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Dear Colleagues,

I'm currently looking at TiNi SMA thin film fabrication for MEMS.  I was
trying to find out whether any one has compared sputtered films using a
single TiNi target v/s separate Ti and Ni targets.  If so what were the
observations?

What are the typical annealing conditions used for annealing the film i.e
The heating rate, atmosphere and cooling rate?

sincerely


Shekhar Bhansali
National Research Laboratory of Metrology
1-4 Umezono 1-Chome
Tsukuba-shi
Ibaraki 305 JAPAN
Phone +81 298 54 4052       Fax:  =81 298 54 4135