For vacuum evaporation, how do you clean your wafers?
What I did was several baths of organic solvents
(Acetone, MeOH, EtOH) and water followed by UV-Ozone,
and finally "Piranha" bath cleaning. Finally I rinse
wafers in DI water and blow dry w/ N2 gas. But after
metal deposition I can still see some particular
impurities apparently imbedded underneath. What should
I do? Thank you for any suggestions and advices.

-Soojin
UNC-CH



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