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MEMSnet Home: MEMS-Talk: PECVD nitride/oxide layer as a mask for KOH silicon etching
PECVD nitride/oxide layer as a mask for KOH silicon etching
2002-10-03
Swiss Chen
PECVD nitride/oxide layer as a mask for KOH silicon etching
Swiss Chen
2002-10-03
Can I use PECVD nitride or oxide layre as a mask for KOH silicon etching? I
just want to etch 10-20um on silicon. Could someone tell me if this works
fine? And also I am not sure if the KOH will attach Au/Cr layer.

Thanks,

Swiss


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