Hi, MEMS researchers
I am do some nano feature on the Au and Cr layer. wet etching will introduce
too much overetching. I am not sure i can use CF4 or SF6 gas to etching Au
and Cr or nor if i use PMMA as mask. if ok, would you like to tell etch
rate?

Thanks
Dlee
Research Asistant
UT At Austin
512-2323521


_________________________________________________________________
Chat with friends online, try MSN Messenger: http://messenger.msn.com