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MEMSnet Home: MEMS-Talk: special photolithography needed
special photolithography needed
2002-11-20
Enzhu Liang
2002-11-20
X. Yuan
2002-11-20
Christopher Blanford
2002-11-20
Greg Miller
2002-11-20
Bill Moffat
2002-11-20
BERAUER,FRANK (HP-Singapore,ex7)
2002-11-21
Alex Pozdin
special photolithography needed
Enzhu Liang
2002-11-20
Hello everyone,

Can we do intentionally uneven exposure to the photoresist? Just imagine a
semisphere containing the photoresist and I am going to get uniform exposure on
the surface of the semisphere. This will require the UV light intensity stongest
in the center and weakest at the edges.If you happen to know this, could you
please tell me how to do it or suggest some reading about it? Thank you very
much.

Best regards,

        E.Liang






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