Hello everyone,

Can we do intentionally uneven exposure to the photoresist? Just imagine a
semisphere containing the photoresist and I am going to get uniform exposure on
the surface of the semisphere. This will require the UV light intensity stongest
in the center and weakest at the edges.If you happen to know this, could you
please tell me how to do it or suggest some reading about it? Thank you very
much.

Best regards,

　　　　　　　　E.Liang