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MEMSnet Home: MEMS-Talk: special photolithography needed
special photolithography needed
2002-11-20
Enzhu Liang
2002-11-20
X. Yuan
2002-11-20
Christopher Blanford
2002-11-20
Greg Miller
2002-11-20
Bill Moffat
2002-11-20
BERAUER,FRANK (HP-Singapore,ex7)
2002-11-21
Alex Pozdin
special photolithography needed
Greg Miller
2002-11-20
E Liang,

Try Caynon Materials they make - Gray Scale masks -

Thanks,

Greg Miller
KVH Industries
8412 W 185th Street
Tinley Park, IL 60477
Email: [email protected]


-----Original Message-----
From: Enzhu Liang [mailto:[email protected]]
Sent: Tuesday, November 19, 2002 4:00 AM
To: [email protected]
Subject: [mems-talk] special photolithography needed


Hello everyone,

Can we do intentionally uneven exposure to the photoresist? Just imagine
a semisphere containing the photoresist and I am going to get uniform
exposure on the surface of the semisphere. This will require the UV
light intensity stongest in the center and weakest at the edges.If you
happen to know this, could you please tell me how to do it or suggest
some reading about it? Thank you very much.

Best regards,

        E.Liang





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