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MEMSnet Home: MEMS-Talk: special photolithography needed
special photolithography needed
2002-11-20
Enzhu Liang
2002-11-20
X. Yuan
2002-11-20
Christopher Blanford
2002-11-20
Greg Miller
2002-11-20
Bill Moffat
2002-11-20
BERAUER,FRANK (HP-Singapore,ex7)
2002-11-21
Alex Pozdin
special photolithography needed
X. Yuan
2002-11-20
The gray-scale mask may do it. The mask could
be very expensive, though.

--- Enzhu Liang  wrote:
> Hello everyone,
>
> Can we do intentionally uneven exposure to the
> photoresist? Just imagine a semisphere containing
> the photoresist and I am going to get uniform
> exposure on the surface of the semisphere. This will
> require the UV light intensity stongest in the
> center and weakest at the edges.If you happen to
> know this, could you please tell me how to do it or
> suggest some reading about it? Thank you very much.
>
> Best regards,
>
> ¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡E.Liang
> ¡¡¡¡¡¡¡¡¡¡
>
>
>
>
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