I performed isotropic silicon etching by wet chemical etching (HNA etchant;
liquid volume ratio HF:HNO3:CH3COOH = 8:75:17). It also etches SiO2 mask at the
same time. In my case, for a SIO2 with 5000A thickness, it can at least etch Si
more than 5 um.

Fang
  ----- Original Message -----
  From: Patrick Carlberg
  To: [email protected]
  Sent: Monday, November 25, 2002 9:48 AM
  Subject: [mems-talk] Etching Si with SiO2 as mask


  Dear all

  I am interesseted in etching Si with SiO2 as an etch mask. Does anyone
  know of a dry or wet etch that can be used?

  All comments are highly apriciated

  Patrick





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