Hi everyone,
I have used image reversal of Az5214 for some time. For my understanding,
the hard bake process make all the exposed area insensitive for any
further exposure. But still, I want to know what exactly happen during the
first exposure and hard bake so that I may even improve my experimental
result. Does anyone know where I can find some detailed priciple
description about image reversal of Az5214 or similar photoresist. Any
suggestion will be really appreciated.

Peng Yao
DOEs lab
Electrical Engineering Dept.
Univeristy of delaware
Newark D.E 19716