> -----Original Message-----
> From: sandhya sandhya [mailto:[email protected]]
> Sent: Monday, December 02, 2002 8:33 PM
> To: [email protected]
> Subject: [mems-talk] WHAT PHOTORESIST TO BE USED?
>
> Hello , I am facing a problem in selecting a resist that can
> withstand hot phosphoric acid etch and can be easily rmoved.
> Can you please kindly suggest me one such resist.Thanking
> yousincerelysandhya reddy

We have looked at several resists in hot phosphoric acid.
All etched rapidly or peeled.

A solution is to use something else as your mask.
We found that gold and niobium are not etched in hot phosphoric acid at 160 C.
Undoped LPCVD silicon dioxide is etched slowly, at 1-2 A/min.

        --Kirt Williams Agilent Technologies