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MEMSnet Home: MEMS-Talk: Etching Si with SiO2 as mask
Etching Si with SiO2 as mask
2002-11-25
Knighton, Ed
2002-11-27
Beverley Eyre
2002-11-27
Beverley Eyre
2002-12-02
Robert C Cole
2002-11-25
Patrick Carlberg
2002-11-25
Hsu-Wei Fang
2002-11-25
Robert Dean
2002-11-25
Hongjun Zeng
2002-11-25
foo foo
2002-11-26
Burkhard Volland
Etching Si with SiO2 as mask
Burkhard Volland
2002-11-26
Hello dear Patrick,
that depends on the requirements of your device. Depth of etching, profile
slope, sidewall roughness, isotropic or anisotropic?

burkhard
-----Ursprüngliche Nachricht-----
Von: foo foo 
An: [email protected] 
Datum: Montag, 25. November 2002 17:30
Betreff: [mems-talk] Etching Si with SiO2 as mask


>Dear all
>
>I am interested in etching Si with SiO2 as an etch mask. Does anyone know
of
>a good wet or dry process?
>
>All sugestions are highly apricitated
>
>Patrick
>



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