I try to etch polyimide (DuPont Pyralin 2611) in a O2-plasma (RIE) and I
always get some residue on the wafer.
Does anybody know how to solve this problem ?
Thanks in advance,
Ralf
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Dipl. Ing. (FH) Ralf Keller
Fraunhofer-Institut fuer Biomedizinische Technik
Fraunhofer Institute for Biomedical Engineering
Ensheimer Str. 48
66386 St. Ingbert, Germany
Tel.: +49 (0) 6894 / 980-158 Fax: ..-400
e-mail: [email protected]
