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MEMSnet Home: MEMS-Talk: thick photoresist for dry etching
thick photoresist for dry etching
2002-12-16
[email protected]
2002-12-16
Mihaela Balseanu
2002-12-17
[email protected]
thick photoresist for dry etching
Mihaela Balseanu
2002-12-16
Try Shipley 1045. It is a G-line PR.

Mihaela

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of [email protected]
Sent: Monday, December 16, 2002 3:44 AM
To: [email protected]
Subject: [mems-talk] thick photoresist for dry etching



Dear members,
I am running a litho process line. For our dry etching process I need a
photoresist with a thickness of 6-9µm. It should have good thermal
resistance properties and good adhesion. Stability and reproducibility is
also a concern as the resist is going to be used in a production.
Step profile is not important as I have large structures. Could anybody
recommend a photoresist?

Mounir Ennabli, M. Sc. E. E.
Grundfos Semiconductor
Direct: +45 44 34 71 58
Fax: +45 44 34 71 72
e-mail: [email protected]

Grundfos a/s
BE>THINK>INNOVATE
mailing address: Ryttermarken 15-21, 3520 Farum
Denmark



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