I spin-coated su8 25 on my ITO wafer and after soft
bake (as instructed by MicroChem) I spin-coated S1813
on it and baked it at 95C briefly. At this stage the
two layers of photoresist look fine. But after UV
exposure (330 um 20 sec), it was apparent that
something's happened on the second PR or interface
btwn S1813 and su8. To describe the apperance it looks
like the surface of the Moon under microscope! Some
bumpy bubble-like stuffs all over the surface. Can
anybody explain what I did? Thank you.


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