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MEMSnet Home: MEMS-Talk: Minimun available thiickness of sputtered metal films
Minimun available thiickness of sputtered metal films
2002-12-31
TEL Klaus Beschorner
Minimun available thiickness of sputtered metal films
TEL Klaus Beschorner
2002-12-31
> Sputtered W and Mo  can meet constant 100~200A film thickness in whole
substrate area ?
> i'm worry about bad coverage on substrate due to very thin thickness.

Well, this will of course depend on your substrate, i.e. surface roughness,
temperature, and wetting angle of your material on the substrate.

100A of W sputtered onto a cold Titanium wetting layer will be a continuous
film. I have no experience with Mo, but W has a high sticking coefficient
on almost everything, and such a thin film should not run into the usual
adhesion problems due to high film stress...

Happy New Year, in your timezone you should have already made it ;-)

best regards,
klaus
--

                        (TEEL)          Tokyo Electron Europe Limited
                                        PVD Process Support  (ex MRC)
Klaus Beschorner                                   Tel +49-7033-45683
Drosselweg 6                                       Fax +49-7033-45631
71120 Grafenau, Germany                       Mobile +49-174 315 7754


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