Dear Mems-Talk Users,
We experienced some shrinkage problems with the S1828 (spun and softbaked)
photoresist after dipping it into Bromine Methanol (1:100). Can anybody suggest
an alternative photoresist for such harsh etchants as Br:MeOH ?
Thanks from now and happy new years,
Oray Orkun Cellek
[email protected]
Research Assistant, Ph. D. Student
Electrical & Electronics Engineering Department
Middle East Technical University
06531 Ankara
Turkey
Tel : +90 312 210 4579
Fax : +90 312 210 1261
