Mr. Lee,
  One method to produce thin, uniform layers is by using an energetic
ion beam for deposition. It is possible to modify standard sputtering
systems to produce a negative ion beam. Conversion kits are available
from www.plasmion.com .

-Mike

>>> [email protected] 12/30/02 07:38 AM >>>
Sputtered W and Mo  can meet constant 100~200A film thickness in whole
substrate area ?



i'm worry about bad coverage on substrate due to very thin thickness.



If impossible , how about using electoplating process?



Happy New Year...

TW Lee.



==================================================

/ aero MEMS Laboratory ,

/ School of Mechanical & Aerospace Engineering,

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