Hello,

     I've read recent and not-so-recent papers that describe the good
     planarization provided by spinning photoresist HPR204 (a low viscosity
     resist). To avoid characterizing another material for such an
     application, I am interested in obtaining some of this resist.  My
     searches for a supplier were fruitless, and I wonder if anyone may be
     able to help.

     Thanks
     Robert Mihailovich
     Rockwell Science Center
     Thousand Oaks, CA