Hello Gunwoo,
Piranha foolwed by BOE will give you a "perfect" Si wafer. Of course,
your dots may be gone as well. What are these dots made of? What is on
your wafer that you *don't* want to strip?


Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Never worry again about the quality of your random numbers!"
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On Wed, 8 Jan 2003, Kim, Gunwoo wrote:

>  Dear all.
>
> I have a little problem.
> I am using a negative pr to make a dot pattern.
> However, after removing pr process using RR4(Dimethyl Sulfoxide) and acetone,
I can still see remained pr within 100nm size on a wafer and around dot
patterns. I tried to remove the pr using extra NMP cleaning step, but still I
can see the pr.
> Would you recommend how can I remove all of the pr within 100nm size and how
can I make a perfect si wafer after cleaning step? It is very important for me
because this process wafer will be moved to MBE chamber without any defect
including remained pr or particles around dot patterns.
> Thank you for your attention.
>
> Best regards,
> Gunwoo Kim
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