Deionized water works well. We usually rinse it for aboout five minutes.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Never worry again about the quality of your random numbers!"
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On Sat, 18 Jan 2003, Kim, GunWoo wrote:

> Dear all,
> I need your help!
> After using a mixed solvent, H2O2 and H2SO4, to remove remained PR
> resides on a wafer, how do I rinse the wafer?
> Please reply!!
> Thanks a lot
>
> Sincerely
> Gunwoo Kim
>
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