Jacques,
        I was unable to find the publication to pull up the technical article.
As my company manufactures equipment for surface modification, both plasma and
silanes, lift off equipment and numerous specialized units for bio-med and MEMS
use, we may have some areas to talk about.  Please get back to me so we can
discuss common problems and equipment.  Bill Moffat

-----Original Message-----
From: Jacques Jonsmann [mailto:[email protected]]
Sent: Wednesday, January 22, 2003 12:57 PM
To: General MEMS discussion; [email protected]
Subject: Re: [mems-talk] Patterning A Hydrophobic Layer


Dear Jessica,

You can find some information on the subject in the following publication:
S. Bouaidat, B. Winther-Jensen, S. Flygenring Christensen, J. Jonsmann,
Patterned plasma-polymerized coatings for bio-MEMS applications, Proc.
Eurosensors âEUR(tm)02.

In this paper we describe how we do it with lift-off. We get excellent
lithographic results (2 micrometer linewidth). Using our low energy density
plasma polymerisation technique, we have made a number of surface
functionalities that can be microstructured by lift-off:

- Hydrophobic (110 deg. contact angle)
- Hydrophilic (20 deg. contact angle)
- Cell binding
- Non fouling (cell non-binding)
- Binding of oligos
- Binding of proteins

Our surfaces withstand the lift-off process, as well as multiple lithographic
steps, thereby allowing more that one microstructured surface functionality on
the same substrate. For example, we have made microstructured hydrophilic and
hydrophobic areas on both silicon and glass.

We offer this microstructured surface functionalisation as a commercial service.
If you are interested in this service, or just want a few pointers (for non-
commercial purposes), please let me know.

Jacques


Dr. Jacques Jonsmann,
Head of Silicon Microfluidics

Scandinavian Micro Biodevices A/S
CAT, DTU, Bldg. 347
DK-2800 Copenhagen - Lyngby, Denmark

Tel.: +45 45256444
Fax.: +45 45256419
e-mail (work): [email protected]
e-mail (home): [email protected]







        -----Oprindelig meddelelse-----
        Fra: Jessica Melin [mailto:[email protected]]
        Sendt: on 22-01-2003 12:31
        Til: [email protected]
        Cc:
        Emne: [mems-talk] Patterning A Hydrophobic Layer



        Dear Colleagues,

        Am searching for practical information / experience on patterning
        hydrophobic layers. For example, depositing a hydrophobic layer (i.e.
        C4F8) on a silicon substrate, spinning on positive or negative
        photoresist (achieving good coverage with or without the use of an
        adhesive intermediate layer), achieving good lithographic results,
        and etching the hydrophobic layer resulting in a patterned
        hydrophobic layer while the silicon retains its surface properties.
        Alternatively, using a successful lift-off process. Any experiences,
        information, recipes, etc would be greatly appreciated.

        Best regards,

        Jessica Melin

        --
        ================================================================
            Jessica Melin
            Royal Institute of Technology
            Department of Signals, Sensors and Systems
            Microsystem Technology
            Osquldas väg 10, 5th floor
            SE-100 44 Stockholm, Sweden

            Phone:              +46 (0)8 790 9231
            Fax:                        +46 (0)8 100858
            Mobile:             +46 (0)73 944 3031
            Email:              [email protected]

            Homepage:         http://www.s3.kth.se/mst
        ================================================================

        _______________________________________________
        [email protected] mailing list: to unsubscribe or change your list
        options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
        Hosted by the MEMS Exchange, providers of MEMS processing services.
        Visit us at http://www.memsnet.org/